Nitrogen trifluoride

CAS: 7783-54-2
Molecular Formula: F3N
Molecular Weight: 71.0019
Product description:1. NF3 is an excellent plasma etching gas, the microelectronics industry of silicon and silicon nitride etching, adoption of NF3 and CF4 + O2 gas mixture had higher etching rate and selectivity, but also for surface free from contamination. NF3 and hydrogen reaction, in an instant with gives off a lot of heat, this is NF3, widely used in high energy chemical laser principle. At high temperatures, NF3 reaction with organic compounds, often accompanied by explosive, operation should be very careful. 2. Used as high quality fuel.